A sputter ion pump consists basically of two electrodes, anode and cathode, and a magnet fig. A sputterion pump consists basically of two electrodes, anode and cathode, and a magnet fig. As with all gas capture pumps, the sputter ion pump requires no backing pump, and does have a limited lifetime, based on its. This paper describes a microscale sputter ion pump and its use in the controlled reduction of pressure in a large cavity package. Hydrogen pumping by sputterion pumps and getter pumps. An ion pump also referred to as a sputter ion pump is a type of vacuum pump capable of reaching pressures as low as 10. Pumped stably in areas of net buildup of sputtered. His investigation about electronic vacuum pumping led in 1957 see fig. Ion pumps sputter ion pumps, getter ion pumps, penning pumps provide a clean, simple, low maintenance alternative for producing and maintaining high and ultrahigh vacuum.
Background sputterion pumps sips are capture pumps. The sputtering is caused by a dc microplasma between two titanium thinfilm electrodes as shown in fig. For the purposes of this laboratory, we will describe the operation of a single cell diode type sputter ion vacuum pump. Sputterion pump article about sputterion pump by the. An ion pump ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 3kv to 7kv, which allows the ions to accelerate into and be captured by a. Use of large speed titanium sublimation pump tsp in combination with sputter ion pumps sip is not always feasible due to space. Sputterion pumps may be single or multiple cell types, and can be of diode or triode design. Make sure the roughing valve is closed black valve handle behind sputterer, left of the liquid n 2 funnel currently there is no switch for the pump. The sputterion pump combines mechanical, electrical, magnetic and chemical principles to permanently capture residual gas molecules in vacuum systems. For the purposes of this laboratory, we will describe the operation of a single cell diode type sputterion vacuum pump. These generic pump types differ in two important ways. When the pump was used to attain ultrahigh vacuum condition, the sputter ion pump was used in combination with a rotary vacuum pump or an absorption pump. A detail treatment of the subject of capture pumps, including sips, is given else where.
Miniature sputterion pump design considerations duniway. A sputter ion pump is a device for producing very high vacuum conditions. Greene 2 1 ghent university, department of solid state sciences, krijgslaan 281 s1, 9000 ghent, belgium 2 materials science and physics departments and the frederick seitz materials research laboratory, university of illinois, urbana, illinois 61801, usa sputter deposition is a widely used technique to deposit thin films on substrates. The following paper outlines the working principles of sputterion pumps.
Pump the gaspurifying micromachined sputter ion pump microsip operates by sputtering titanium, bonding this titanium to gas molecules, and removing these molecules from the environment. Both cathodes are made of titanium and the structure is simple and rugged. Ion pump sputter ion pump modion ion vacuum pumps by j. This involves ejecting material from a target that is a source onto a substrate such as a silicon wafer. Hydrogen in the pump walls and anodes limits the base pressure of the pump.
Operating principle of sputter ion pumps ions from a gas discharge impinge on the cathode of an electrode system within the pump housing thereby sputtering the cathode material titanium, in conventional pumps. A, b constructed sputter ion pump, c the model of constructed pump. Pdf application of compact negsputter ion pump combination in. Ulvacs acter pumps were developed to enable single sputter ion pumps to create ultrahigh vacuum on the order of 1010 pa. In all types of ion sources, the gas ions are produced by various types of gas discharge including electron collisions with gas atoms. Distributed sputterion pumps for use in low magnetic fields article pdf available in ieee transactions on nuclear science 263. At low pressures sputter ion pumps is produced by sorption processes, which are released by ionised gas particles. An ion pump also referred to as a sputter ion pump is a type of vacuum pump which operates by sputtering a metal getter.
Study of plasma and ion beam sputtering processes 129 of an ion source for a particular application should be made with due consideration of factors such as species and intensity capability, beam quality emittance and brightness, ionization efficiency, reliability,ease of operation, maintenance, and source lifetime. Various parameters, such as magnetic field, electrode voltage, operating pressure, pump history, electrode contamination and partial pressure of other gases are shown to have a major influence on the pumping speed for any given gas. After prolonged periods of sputtering with argon gas, the ion pumps can become saturated, resulting in occasional. All parts of the pump was carefully cleaned and assembled in clean conditions after construction. Sputter ion pump models v20, v30, v60, v110, v140, v220, v270. The general requirements are a source of electrons, a small region. Sputter deposition is a physical vapor deposition pvd method of thin film deposition by sputtering. An ion pump ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 37 kv, which allows the ions to accelerate into and be. An ion pump is a type of vacuum pump which operates by sputtering a metal getter. Other articles where sputter ion pump is discussed. Using the anode layer ion source from as an ion pump. The pumping speed is achieved by parallel connection of many individual penning cells. The pumping mechanisms for reactive and inert gas species, as well as argon.
Uspas june 2002 ion pumps page 22 sputter ion pump current may be used to measure pressure in the pump body pressure is linearly proportional to current. Vacuum science and technology for accelerator vacuum. Sputter ion pumps are one type of pump used to create ultrahigh vacuum, and are used in many analyzers and accelerators. Under ideal conditions, ion pumps are capable of reaching pressures as low as 10. Ion pump rejuvenation procedure rbd techspot rbd instruments. Agilent celebrates the 60 year anniversary of the ion pump invention at varian associates by j. The sputter ion pump combines mechanical, electrical, magnetic and chemical principles to permanently capture residual gas molecules in vacuum systems. The full speed of the pump is developed in the pressure range from about 106 to 108 torr, although the. The neg pump, coupled to a distributed sputterion pump sip mostly intended to pump residual argon and possibly methane constitutes the principal pumping system for the uhv regime, allowing routine operation in the low 1011 torr range. As with all gas capture pumps, the sputterion pump requires no backing pump, and does have a limited lifetime, based on its. An overview of sputterion pump weight versus pumping speed will initially. Typical examples for the ipc0062 would be the 8 ls, 20 ls, 30 ls and 60 ls models. Occasionally, questions or problems about performance may arise and this document is meant to help with resolving those issues. Design and construction of a prototype sputter ion pump in ilsf.
Pumping mechanisms in sputterion pumps low pressure. An ion pump first ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 37 kv, which accelerates the ions into a solid electrode. Capacities are available up to 14,000 cu ft per minute, with an operating pressure range of 102 torr to below 1011 torr. The 9210062 ion pump control unit is designed to operate either diode or triode sputter ion pumps in both the normal and start modes. They are designed for developing new elements acter elements with improved evacuation characteristics at ultrahigh and extremely high vacuum, and. A sputter ion pump currently used was developed and completed in the nineteen seventies and the exhaust region of the pump was about 103 pa to 109 pa in those days. Ion pumps operation and applications duniway stockroom. The pump was baked at 300c and pressures of 106 torr. D esp ite the widespread use of sputterion pum ps in alm ost all vacuu m applications, our know ledge about the influence of the different p u m p param eters on.
The pumping effect is based chiefly on gettering processes. Sputtered atoms ejected from the target have a wide energy distribution. At high pressures of hydrogen, maximum speeds are obtained with the gas diffusing rapidly into the cathodes, but since the diffusion is sensitive to surface contamination, relatively low partial pressures of gases such as nitrogen can greatly reduce the speed. Application of compact negsputter ion pump combination in uhv system of hiaf article pdf available in vacuum 157 august 2018 with 99 reads how we measure reads. A new approach for computing diode sputterion pump. Pumping mechanisms in sputter ion pumps are quite different for different gasses, and as a consequences pumping speeds are different too. Ion pumps sputterion pumps, getterion pumps, penning pumps provide a clean, simple, low maintenance alternative for producing and maintaining high and ultrahigh vacuum. A conventional sputter ion pump comprises a vacuum envelope housing, at least one cathode electrode, an anode electrode formed as a plurality of hollow cylindrical cells, and means for applying to. Resputtering is reemission of the deposited material during the deposition process by ion or atom bombardment. Sputter ion pumps may be single or multiple cell types, and can be of diode or triode design. Optimization of sputter ion pumps 4 technology innovation in uhv 8 references11.224 896 1067 613 202 1513 745 1410 493 1347 1141 13 629 1279 981 649 213 497 538 235 1607 622 112 485 1050 1108 1456 135 861 827